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主要題名:Growing sub-micron diamond films by a novel microwave plasma jet CVD system
作者姓名:Lin, Chii-RueyHsu, Chih-MingHung, Hsin-ChinLiao, Guo-TsaiSu, Chun-Hsi
摘要:A microwave plasma jet chemical vapor deposition (MPJCVD) method, which utilizes antenna to guide microwaves, is a technology that hasn' t successfully applied to grow diamond films. This study overcame difficulties in system design and grew sub-micron diamond films using a self-assembled MPJCVD system. The advantageous high-density plasma of such microwave plasma jet can largely improve the uniformity of plasma density which is usually a problem in the traditional microwave plasma system. The MPJCVD of this study can provide a plasma jet with a cross-section of about 1 cm and possesses a moveable seat to grow a large area of diamond films. This study pretreated silicon substrates with ultrasonic-energized diamond powders. In an atmosphere of 0.25% methane-to-hydrogen ratio, a diamond film with its grains of nearly 0.5 um can be successfully synthesized using a high temperature plasma jet under microwave powers of 600 W, 800 W, and 1000 W. The field emission scanning electron microscopy (FESEM), Raman spectrometer, X-ray diffractometer (XRD), and X-ray photoelectron spectrometer (XPS) are used to characterize the as-grown diamond films. The results show such sub-micron diamond films possess perfect crystals and grains of averaged 0.5 mum.
貢獻者資料:機電學院/製造科技研究所;機電學院/機電科技研究所
論文ID:10205-me-pc-2006-10_1p
典藏單位:國立臺北科技大學
數位物件檔名:10205-me-pc-2006-10_1p.pdf
發行日期:2006-10
統一資源識別號:http://dx.doi.org/10.1109/ICSMC.2006.385052
註:©2006 IEEE
資料開放狀態:開放
研討會:Systems, Man and Cybernetics, 2006. SMC '06. IEEE International Conference on,8-11 Oct. 2006, Taipei, Taiwan
論文起迄頁碼:pp4733 - 4737