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論文中文名稱:不連續金屬薄膜之光學特性探討 [以論文名稱查詢館藏系統]
論文英文名稱:The optical properties of semicontinuous metal films [以論文名稱查詢館藏系統]
院校名稱:臺北科技大學
學院名稱:電資學院
系所名稱:光電工程系研究所
畢業學年度:98
出版年度:99
中文姓名:林昭輝
英文姓名:Jau-Huei Lin
研究生學號:97658028
學位類別:碩士
語文別:中文
口試日期:2010-07-23
論文頁數:57
指導教授中文名:任貽均
口試委員中文名:藍永強;張淑美;周趙遠鳳
中文關鍵詞:不連續金屬膜臨界閥值光學導納
英文關鍵詞:semicontinuous metal filmpercolation thresholdoptical admittance
論文中文摘要:本論文以電子槍蒸鍍系統製鍍不同填充率之不連續銀金屬薄膜,當不連續金屬薄膜濃度達到臨界閥值(percolation threshold) pc時,其薄膜性質會從介電質特性轉成金屬特性。利用光譜可以判斷金屬濃度何時達到臨界閥值。當濃度到達臨界閥值時,其光譜穿透率在紅外光區為一穩定值,且吸收達到約40%。
在結構上,以SEM觀察其表面形態。藉由對SEM圖片進行影像處理,可以計算出金屬濃度。由SEM圖形可以看出,到達臨界閥值時其連續路徑之變化。
藉由在不連續銀金屬膜上面鍍上一層介質層,之後再利用光學導納之理念反推薄膜的等效導納。由導納軌跡的趨勢,解釋金屬濃度變化,其介電質特性到金屬特性的相位轉換之成因。
論文英文摘要:In this study, we fabricated semicontinuous silver film with different concentrations by electron-beam evaporation. As the metal concentration reach to the percolation threshold, the characteristics of semicontinuous silver film are changed from dielectric into metal.
The percolation threshold of metal films was determined by the optical spectrum. The optical transmittance of thin films at the percolation threshold is constant over a wide wavelength band in the IR region. And the optical absorption near the transition is found to be 40% and independent of wavelength.
The surface morphology of the samples was observed by scanning electron microscopy. The metal concentration for each scanning electron micrograph was calculated by using image-processing techniques. The connected pathway of metal film which varies with metal concentration can be observed from scanning electron micrograph.
The equivalent admittance of semicontinuous silver films can be retrieved by using characteristic matrix, which will explain the reason of phase transition from insulator to metal by the changes of metal concentration.
論文目次:目 錄

中文摘要 i
英文摘要 ii
誌謝 iii
目錄 iv
表目錄 vi
圖目錄 vii
第一章 緒論 1
1.1不連續金屬膜介紹 1
1.2薄膜成長理論 2
1.3臨界閥值(percolation threshold, ) 4
1.4文獻回顧 6
1.4.1 表面結構特性研究 7
1.4.2 光學特性與電性研究 8
1.4.3 近場光學分析 10
1.4.4 製程影響 11
1.4.5 不連續膜的電場模擬 19
1.4.6 膜層堆疊 20
1.5研究動機 23
第二章 量測與實驗 24
2.1光學導納 24
2.2使用干涉儀量測得到等效導納 26
2.2.1 等反射率曲線與等相位曲線 26
2.2.2 干涉儀架構圖 27
2.2.3 干涉儀反射相位計算 28
2.3以導納觀念反推等效導納 29
2.4製鍍系統 32
2.5鍍膜參數 33
2.6光學監控 34
2.7表面型態分析 36
2.8氟化鎂光學參數量測 37
第三章 實驗數據與整理 38
3.1干涉儀量測數據 38
3.2金屬表面結構 39
3.3不同金屬填充率之光譜圖 44
3.4單層氟化鎂薄膜參數 46
3.5不連續銀金屬膜之等效導納 53
第四章 結論 55
參考文獻 56
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論文全文使用權限:同意授權於2015-08-24起公開